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Engineering Ferroelectric Hf0.5Zr0.5O2 Thin Films by Epitaxial Stress

Saul Estandía, Nico Dix, Jaume Gàzquez, Ignasi Fina, Jike Lyu, Matthew F. Chisholm, Josep Fontcuberta, Florencio Sanchez. ACS Appl. Electron. Mater. 2019. Publication Date:July 3, 2019https://doi.org/10.1021/acsaelm.9b00256 ...

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