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Engineering Ferroelectric Hf0.5Zr0.5O2 Thin Films by Epitaxial Stress

Saul Estandía, Nico Dix, Jaume Gàzquez, Ignasi Fina, Jike Lyu, Matthew F. Chisholm, Josep Fontcuberta, Florencio Sanchez. ACS Appl. Electron. Mater. 2019. Publication Date:July 3, 2019https://doi.org/10.1021/acsaelm.9b00256 ...

2019

... .1002/admi.201900475 Engineering Ferroelectric Hf0.5Zr0.5O2 Thin Films by Epitaxial Stress Por: Estandia, Saul; Dix, Nico; Gazquez, Jaume; et ál.. ACS APPLIED ELECTRONIC MATERIALS Volumen: 1 Número: 8 Págin ...

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