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Epitaxial ferromagnetic oxide thin films on silicon with atomically sharp interfaces

Epitaxial ferromagnetic oxide thin films on silicon with atomically sharp interfaces

P. de Coux, R. Bachelet, B. Warot-Fonrose, V. Skumryev, L. Lupina, G. Niu, T. Schroeder, J. Fontcuberta and F. Sánchez. Appl. Phys. Lett. 105, 012401 (2014)

Li+-Mediated BC Cross-Coupling

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 limediated

David Olid, Clara Viñas, Francesc Teixidor

Chemistry - A European Journal Volume 18, Issue 41, pages 12936–12940, October 8, 2012

DOI: 10.1002/chem.201201881


 

Easy as A, B[BOND]C: B[BOND]C cross-coupling on [3,3′-Co(8-I-1,2-C2B9H10)(1′,2′-C2B9H11)], [1], the best specimen of metallacarboranes, is easily produced in a reaction mediated by Li+ in the absence of a transition-metal catalyst (see figure). Pure RLi or a mixture of Li reagents (tBuLi+RLi) is adequate to produce the B[BOND]C bond. Notably, a threshold of RLi (or tBuLi+RLi)/[1], 2:1, is required to initiate the B[BOND]C coupling, which acts, at least in part, as a source of soluble Li+.

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