Menu
Director's Message and Videos

Director's Message and Videos

Welcome to our web site. Thr...

Take a look

Take a look

Scientific and Technical Ser...

Personnel

Personnel

  Personnel List

Jobs

Jobs

Available Positions

Prev Next
Epitaxial ferromagnetic oxide thin films on silicon with atomically sharp interfaces

Epitaxial ferromagnetic oxide thin films on silicon with atomically sharp interfaces

P. de Coux, R. Bachelet, B. Warot-Fonrose, V. Skumryev, L. Lupina, G. Niu, T. Schroeder, J. Fontcuberta and F. Sánchez. Appl. Phys. Lett. 105, 012401 (2014)

Grafting of Metallacarboranes onto Self-Assembled Monolayers Deposited on Silicon Wafers

  • Hits: 9316

mcontent


Dr. Emilio José Juárez-Pérez, Dr. Michel Granier, Prof. Clara Viñas, Dr. P. Hubert Mutin, Dr. Rosario Núñez,*; Chemistry – An Asian Journal Volume 7, Issue 2, pages 277–281, February 6, 2012

DOI: 10.1002/asia.201100750


Stuck on you: Amine-, oxyamine-, and isocyanate-terminated self-assembled monolayers were deposited on silicon wafers for reaction with cobaltabisdicarbollide derivatives. The reaction of the isocyanate group with [NMe4][8-NH2-C4H8O2-3,3-Co(1,2-C2B9H10)(1,2-C2B9H11)] gave homogeneous monolayers of cobaltabisdicarbollide moieties covalently linked to the surface (see picture).

Organisation

Sc.&Technical Services

Scientific Highlights

Links of interest

pie2014

sts banner

logoeugris    mecgris    csicgris
bncbgris          uabgris        uabceigris      pruabgris