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Spatial atmospheric atomic layer deposition: a new laboratory and industrial tool for low-cost photovoltaics

GA

Mater. Horiz., 2014,1, 314-320

DOI: 10.1039/C3MH00136A

Recently, a new approach to atomic layer deposition (ALD) has been developed that doesn't require vacuum and is much faster than conventional ALD. This is achieved by separating the precursors in space rather than in time. This approach is most commonly called Spatial ALD (SALD). In our lab we have been using/developing a novel atmospheric SALD system to fabricate active components for new generation solar cells, showing the potential of this novel technique for the fabrication of high quality materials that can be integrated into devices. In this minireview we will introduce the basics of SALD and illustrate its great potential by highlighting recent results in the field of photovoltaics.

 

See more posts on ICMAB related to: Materials for energy and enviroment
See more posts on ICMAB related to: David Muñoz-Rojas , Judith MacManus-Driscoll

Related Topics: Materials for energy and enviroment

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