The Quanta 200 ESEM FEG from FEI is a special and advanced type of high performance scanning electron microscope (SEM). The FEI Quanta 200 FEG is a state of the art field emission microscope that allows nanometer level inspection of materials.
It is equipped with a field emission gun (FEG) for optimal spatial resolution. The instrument can be used in high vacuum mode (HV), low-vacuum mode (LV) (water vapour injection), and environmental SEM mode (ESEM). This makes it possible to study samples in pressures up to 5 Torr. It is engineered to provide maximum data with non-destructive analytical techniques- imaging and microanalysis – from all types of specimens, with or without preparation. The microscope is equipped with an Energy Dispersive X-ray (EDX) system for chemical analysis. Qualitative and quantitative analysis, elemental mapping and linescans can be performed. Lithography and nano-lithography can be performed by a RAITH e-beam.
The scanning electron microscopy service, equipped with a QUANTA FEI 200 FEG-ESEM offers a powerful imaging tool for both, routine and advanced inspection of materials. The service is intended to offer high resolution facilities (1.2 nm @30kV) with a field emission gun, specially suited for the morphological characterization of nanocrystals, nanostructured materials and surfaces. Image contrast proportional to the atomic number is also available with high lateral resolution (2.5 nm @30kV) using an electron backscattered detector. The instrument can be used in high vacuum mode, low-vacuum mode (the chamber pressure is monitored by water vapour injection), and environmental SEM mode (ESEM). This makes it possible to study samples in pressures up to 5 Torr. The resolution is kept high at all conditions: 1.2 nm and 1.5 nm at 30kV in the high and low vacuum modes, respectively. The capability to vary the chamber pressure is specially suited for the observation of uncoated non-conducting materials. The microscope also features an EDS detector designed for light elements starting from Be, with an energy resolution of 132 eV. This tool enables the chemical analysis with a high lateral resolution (point analyses and elemental mapping), as required for the characterization of complex multicomponent nanostructured materials. The service includes electron beam lithography, used in many research activities at ICMAB like development of organic devices, the fabrication of substrate templates designed for defect engineering in thin epitaxial superconducting films, investigation of surface self-organization phenomena, and the fabrication of magnetoelectronic devices. Lithography and nano-lithography can be performed by a RAITH e-beam.
An environmental SEM, enabling characterization of non-conducting without a conductive, and is equipped with EDS (light element) and electrón-beam.
- SEM pictures of different materials obtained by the Scanning Electron Microscope QUANTA FEI 200 FEG-ESEM