The Service of Thin Films has been created to offer to the researchers the capability of fabrication of complex oxides thin films and heterostructures combining oxides and metals.
The deposition techniques are pulsed laser deposition (PLD) for oxides and sputtering for metals. Currently there are two PLD set-ups installed, and in short time both systems will be connected to a chamber with several sputtering units. PLD is a physical vapour deposition technique that uses ultraviolet laser radiation to vaporize material that is transferred to the substrate. The plot in Figure 1 is a sketch illustrating a PLD set-up.